Tantalum Pentoxide 

Tantalum Pentoxide (Ta₂O₅), also known as tantalum(V) oxide, is used in modern capacitors and as a -k dielectric in DRAM capacitors. It can be etched using Inductively Coupled Plasma (ICP) and Reactive Ion Etching (RIE). Ta₂O₅ may be deposited using Atomic Layer Deposition (ALD).