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2D Materials Solutions

The Nanofab delivers performance growth of nanomaterials with in-situ catalyst activation and rigorous process control.

  • Cold wall with showerhead based
  • uniform precursor delivery
  • Remote plasma via ICP option
  • Vacuum load lock for quick sample exchange
  • Excellent uniformity
  • Optional liquid/solid source delivery system for growth of MoS2,MoSe2 and other TMDCs
  • Variable sample sizes up to maximum 200mm wafers
  • Multiple view ports for diagnostics

Introducing... FlexAL ! ALD processing for materials

  • ALD of metal dichalcogenides for nanodevice applications
  • H2S plasma & H2S gas dosing
  • Growth on 200mm wafers
  • Growth of ALD dielectrics & other ALD layers on materials in one tool
  • table (up to 600°C)
  • RF substrate biasing option for process flexibility
  • In situ process monitoring option using spectroscopic ellipsometry & mass spectrometry
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