2D Materials Solutions

The Nanofab delivers performance growth of nanomaterials with in-situ catalyst activation and rigorous process control.

• Cold wall with showerhead based
• uniform precursor delivery
• Remote plasma via ICP option
• Vacuum load lock for quick sample exchange
• Excellent uniformity
• Optional liquid/solid source delivery system for growth of MoS₂,MoSe₂ and other TMDCs
• Variable sample sizes up to maximum 200mm wafers
• Multiple view ports for diagnostics

Introducing... FlexAL ! ALD processing for materials

• ALD of metal dichalcogenides for nanodevice applications
• H₂S plasma & H₂S gas dosing
• Growth on 200mm wafers
• Growth of ALD dielectrics & other ALD layers on materials in one tool
• table (up to 600°C)
• RF substrate biasing option for process flexibility
• In situ process monitoring option using spectroscopic ellipsometry & mass spectrometry

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