牛津仪器集团成员
Zinc Oxide (ZnO) is a wide bandgap II-VI semicondcutor. It has applications in LEDs and transparent conducting (TCOs).
It can be etched using Inductively Coupled Plasma (ICP) and Reactive Ion Etching (RIE).
ZnO may be deposited using Atomic Layer Deposition (ALD).
Process demonstrates damage etching with good quality and excellent uniformity.
quality, tuning of resistivity from semiconductive to conducting by doping and plasma exposures.
© 牛津仪器 2024
公安机关备案号31010402003473
