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Zinc Oxide (ZnO) is a wide bandgap II-VI semicondcutor. It has applications in LEDs and transparent conducting (TCOs).
It can be etched using Inductively Coupled Plasma (ICP) and Reactive Ion Etching (RIE).
ZnO may be deposited using Atomic Layer Deposition (ALD).
Process demonstrates damage etching with good quality and excellent uniformity.
quality, tuning of resistivity from semiconductive to conducting by doping and plasma exposures.
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