Silicon Etching - 牛津仪器

Silicon (Si) is a chemical element with symbol Si and atomic number 14.
A hard and brittle crystalline solid with a blue-grey metallic lustre, it is a tetravalent metalloid and .

rate, selectivity deep silicon etch process using alternating deposition and etch steps
Applicable to silicon, silicon-on-insulator (SOI) and silicon on glass
Wafer size: up to 2"
- Product: PlasmaPro 80
Wafer size: up to 200mm
- Product: PlasmaPro 100 Estrelas

Deep Silicon Bosch etch

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Poly Si can use different chemistries using pure and diluted silane. quality Poly Si over 2inch wafers.

Wafer size: up to 200mm
- Product: PlasmaPro 100 / PlasmaPro 100 Estrelas

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Si may be dry etched using HBr based selective silicon etching with the Inductively Coupled Plasma (ICP) process technique.

Large process database on various process chemistries.
Competitive process results in a large number of applications from black Si formation to aspect ratio features.

Wafer size: up to 200mm
- Product: PlasmaPro 100

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Isotropic Si etch with selectivity to Photoresist (PR) and Silicon Oxide (SiO₂)
Also applicable as a MEMS release etch
Wafer size: up to 200mm
- Product: PlasmaPro 100 / PlasmaPro 100 Estrelas

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Deep Si etching using a simple and extremely clean plasma chemistry at cryogenic temperatures
Vertical features with smooth sidewalls
Wafer size: up to 200mm
- Product: PlasmaPro 100 / PlasmaPro 100 Estrelas

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selectivity cryo-silicon etch

Silicon

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