牛津仪器集团成员
扩展

Silicon

Silicon (Si) is a chemical element with symbol Si and atomic number 14.
A hard and brittle crystalline solid with a blue-grey metallic lustre, it is a tetravalent metalloid and .

  • rate, selectivity deep silicon etch process using alternating deposition and etch steps
  • Applicable to silicon, silicon-on-insulator (SOI) and silicon on glass
  • Wafer size: up to 2" 
  • Wafer size: up to 200mm   
Bosch deep Si etching

Deep Silicon Bosch etch

了解更多信息

Poly Si can use different chemistries using pure and diluted silane.  quality Poly Si over 2inch wafers.

了解更多信息

Si may be dry etched using HBr based selective silicon etching with the Inductively Coupled Plasma (ICP) process technique. 

Large process database on various process chemistries.
Competitive process results in a large number of applications from black Si formation to aspect ratio features.

了解更多信息
  • Isotropic Si etch with selectivity to Photoresist (PR) and Silicon Oxide (SiO2)
  • Also applicable as a MEMS release etch
  • Wafer size: up to 200mm
了解更多信息
  • Deep Si etching using a simple and extremely clean plasma chemistry at cryogenic temperatures
  • Vertical features with smooth sidewalls
  • Wafer size: up to 200mm
了解更多信息
Cryogenic Si etch

Cryogenic Si etch

Cryogenic Si etch

Cryogenic Si etch

Ultra high selectivity cryo-silicon etch

selectivity cryo-silicon etch


相关产品

沪ICP备17031777号-1 公安机关备案号31010402003473