Titanium Dioxide (TiO2) has a Refractive Index of 2.488, 2.583 or 2.609 depending on which form. It can be used in optical coatings for mirrors or filters.
TiN may be deposited using Atomic Layer Deposition (ALD) or Ion Beam Deposition (IBD) and etched using Inductively Coupled Plasma (ICP).
Highly anisotropic profile - Small area slanted etch also possible.
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