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Nickel 

Nickel (Ni) is highly corrosion resistant and is used for electrical contacts. It may be deposited using Ion Beam Deposition (IBD) and it can be etched using Inductively Coupled Plasma (ICP), Reactive Ion Etching (RIE) or Ion Beam Etch (IBE).

Competitive etching rate with good control of redeposition.

More on ICP 了解更多信息

Competitive etching rate with good control of redeposition.

More on RIE 了解更多信息

Process expertise applied to control redeposition and produce good profile at competitive etching rate. 

  • Wafer size: up to 200mm
More on IBE 了解更多信息

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