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牛津仪器等离子体技术部门--提供专业的刻蚀和沉积工艺解决方案


LAB – 
RESEARCH & DEVELOPMENT SOLUTIONS


FAB – 
VOLUME PRODUCTION SOLUTIONS


SUPPORT – 
GLOBAL CUSTOMER SERVICES

解决方案 & 应用

Plasma technology is used in the fabrication of most semiconductor devices created today across a wide range of industries. It is able to provide unique solutions for the creation and manipulation of matter with atomic-scale accuracy.

WORLD-LEADING SYSTEMS

High-performance, reliable and flexible systems across several etching & deposition technologies. Systems range from single load-lock R&D systems to full clusterable production systems for high volume manufacturing.

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