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 Cobalt

Cobalt (Co) is used in mainstream production as a barrier to inhibit electromigration and the production of specialised, wear resistant, alloys. It is etched using Inductively Coupled Plasma (ICP) or Ion Beam Etching (IBE). Instruments Plasma Technology process expertise is applied to control redeposition and produce good profile at competitive etching rate.

More on ICP 了解更多信息
  • Wafer size: up to 200mm
More on IBE 了解更多信息

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