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Atomic Scale Processing

我们的等离子加工设备为原子级的工艺提供了一个完整的解决方案。为了满足量产的需要,可提供集群式或单一式系统以确保材料制备的精度达到原子尺度。

推动原子级别的工艺创新

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ALD of dielectrics

Atomic layer deposition of dielectrics & metals with low damage

Atomic layer deposition
Atomic layer deposition of dielectrics & metals with low damage

Atomic layer deposition of dielectrics & metals with low damage

1D & 2D materials growth

Chemical Vapour Deposition & ALD of atomically thin structures: 1D & 2D materials

CVD growth of ZnO nanowires using DEZn precursors

CVD growth of ZnO nanowires using DEZn precursors.
(Courtesy of Nanoscience Centre, Univ. of Cambridge)

CVD growth of hBN

CVD growth of hBN

Atomic Layer Etch

Atomic layer etching of Silicon, GaN & 2D materials

Atomic layer etching
25nm wide Si trenches etched to 110nm depth by ALE, HSQ mask still in place

25nm wide Si trenches etched to 110nm depth by ALE, HSQ mask still in place


Atomic Scale Processing Systems

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