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Germanium Antimony Telluride

GST (full chemical formula Ge2Sb2Te5) is used as a shift memory . GST and related films may be dry etched using Inductively Coupled Plasma (ICP), Reactive Ion Etching (RIE) or Ion Beam Etch (IBE).

More on ICP 了解更多信息
  • Wafer size: up to 200mm  
  • Product:  Ionfab300
More on IBE 了解更多信息
More on RIE 了解更多信息

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