Atomic Layer Deposition for 2D materials & devices

Dr Harm Knoops and Dr Daniel Neumaier discuss the challenges and possibilities of using ALD to grow various materials such as dielectrics on graphene and other 2D materials.

The webinar comprises of two talks, with a Q&A session at the end:

• Atomic Layer Deposition for graphene devices | Dr Daniel Neumaier
• Atomic Layer Deposition on and of 2D materials | Dr Harm Knoops

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Meet the presenters

Dr.ir. Knoops is a Technical Sales Specialist (ALD) for Oxford Instruments Plasma Technology and holds a part-time researcher position at the Eindhoven University of Technology. His work covers the fields of (plasma-based) synthesis of thin films, advanced diagnostics and understanding and developing plasma ALD and similar techniques. His main goals are to improve and advance ALD processes and applications for Oxford Instruments and its customers. He has authored and co-authored more than 30 technical papers in peer-reviewed journals. www.linkedin.com/in/harmknoops/

Dr. Daniel Neumaier is the head of the Graphene group at AMO GmbH since 2009. He studied physics and obtained a PhD in 2009. His current research interests are graphene based devices for high-frequency electronic, optoelectronic and sensor applications. In the Flagship-Project Graphene, Daniel Neumaier is leader of the work-package Electronics Devices and head of Division 3. He has authored and co-authored more than 50 scientific or technical papers in peer-reviewed journals.