The ICPCVD process module is designed to produce high quality films at low growth temperatures, enabled through high-density remote plasmas that achieves superior film quality with low substrate damage.
This ICPCVD process module is designed to produce high quality films at low growth temperatures, enabled through high-density remote plasmas that achieves superior film quality with…
PlasmaPro 80是一种结构紧凑且使用方便的小型直开式系统,可以提供多种刻蚀和沉积的解决方案。 它易于放置,便于使用,且能够确保工艺性能。直开式设计可实现快速晶圆装卸,是科学研究、原型设计和小批量生产的理想选择。 它通过优化的电极冷却和出色的衬底温度控制来实现高性能工艺。