Atomic Layer Etching (ALE) Systems

In order to realise true ALE at a reasonable rate fast, accurate control of gas flows and plasma powers are required, the PlasmaPro 100 ALE delivers this through specialised hardware including:

• Precise control of gas dose using fast acting MFCs
• Excellent repeatability of low power RF delivery
• Rapid switching enabled by fast PLC

All these combine to enable etching with accuracy at the atomic scale